| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern such that the accuracy of a photomask or alignment accuracy do not influence the position accuracy of the resist pattern to be formed, and to provide a method for manufacturing a color filter by using the above method for forming the resist pattern. SOLUTION: The method includes a process of preparing a substrate, a process of forming a resist layer by using a chemically amplifying resist containing an acid generating agent on a substrate, a process of exposing at least a partial region of the resist layer to decompose the acid generating agent in the exposed region of the resist layer to produce an acid in the resist layer, a process of selectively deactivating a part of the produced acid in the resist layer according to a specified pattern so as to form a region where the acid remains and a region which does not substantially contain the acid in the resist layer, a process of allowing the chemically amplifying resist in the region where the acid remains to react, and a process of developing the resist layer by using the difference in the solubility of the chemically amplifying resist between in the region where the acid remains and the region which does not substantially contain the acid. |
