发明名称 CONTACT PROBE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a contact operation with high accuracy even in an IC chip or the like which is provided with high-accuracy bent contact pins and staggered or offset electrode pads in a contact probe and its manufacturing method. SOLUTION: In the contact probe 10, a plurality of pattern interconnections 12 are formed on the surface of a film 11, and respective tips of the pattern interconnections are arranged in a protruding state from the film so as to be used as the contact pins 12. A hole part 11c or a slit part which is arranged in the base end part of every contact pin is formed. Every contact pin is bent while the hole part of the slit part is used as a starting point.
申请公布号 JP2002031651(A) 申请公布日期 2002.01.31
申请号 JP20000215131 申请日期 2000.07.14
申请人 MITSUBISHI MATERIALS CORP 发明人 ISHII TOSHINORI;FUJIMORI SHUJI;KAWAKAMI YOSHIAKI
分类号 G01R31/26;G01R1/073;H01L21/66;(IPC1-7):G01R1/073 主分类号 G01R31/26
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