发明名称 N-TYPE NITRIDE SEMICONDUCTOR LAMINATE AND SEMICONDUCTOR DEVICE USING SAME
摘要 <p>An N-type nitride semiconductor laminate includes a substrate, a buffer layer made of AlaGa1-aN (0.05 ≤ a ≤ 0.8) which is formed on a surface of the substrate, and an n-side nitride semiconductor layer which is formed on the buffer layer.</p>
申请公布号 WO2002003474(A2) 申请公布日期 2002.01.10
申请号 JP2001005690 申请日期 2001.07.02
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