发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing system capable of preventing a dispersed mist in cup from adhering to a substrate again. SOLUTION: A fin 93 as a first guide member for guiding the atmosphere dispersed by the centrifugal force of a rotating substrate (G) to a lower part of an inner wall of an outer cup 57 is provided in the inner wall of the outer cup 57. Similarly, a fin 94 as a third guide member for guiding the atmosphere dispersed by the centrifugal force of the rotating substrate (G) to a lower part of an inner wall of an inner cup 58 is provided at the inner wall of the inner cup 58. Under the outer cup 57 and the inner cup 58, a fin 95 is fixed to an upright wall 64 in a way that the fin 95 is astride a lower side of the outer cup 57 and a lower side of the inner cup 58.
申请公布号 JP2001351857(A) 申请公布日期 2001.12.21
申请号 JP20010088691 申请日期 2001.03.26
申请人 TOKYO ELECTRON LTD 发明人 KAWAGUCHI YOSHIHIRO;MIYAZAKI KAZUHITO;YAHIRO SHUNICHI
分类号 G03F7/30;B05C11/08;B05C11/10;B05C21/00;B05D1/40;B05D3/00;B05D3/10;B05D7/00;H01L21/027;H01L21/306;(IPC1-7):H01L21/027 主分类号 G03F7/30
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