发明名称 |
High density plasma processing apparatus |
摘要 |
Disclosed is a high density plasma processing apparatus having a resonance antenna coil. The apparatus includes a processing chamber providing a hermetically sealed plasma generating space and having a planar surface on a top wall; a plurality of gas pipes that inject process gases into the processing chamber; a plurality of loop-shaped antennas installed on the planar surface and connected in parallel; a resonance antenna coil receiving a high frequency power and including the plurality of loop-shaped antennas and a plurality of variable capacitor that are connected in parallel with the plurality of loop-shaped antennas in order to maintain a resonance state therebetween; a means for heating the resonance antenna coil by way of using a heat exchange medium; and a means for fixing a substrate inside the processing chamber parallel with the planar surface of the top wall of the processing chamber.
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申请公布号 |
US2001052394(A1) |
申请公布日期 |
2001.12.20 |
申请号 |
US20010881908 |
申请日期 |
2001.06.15 |
申请人 |
JUNG SOON-BIN;CHUNG BO-SHIN |
发明人 |
JUNG SOON-BIN;CHUNG BO-SHIN |
分类号 |
H01J37/32;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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