发明名称
摘要 <p>A process for the removal of a component selected from helium and hydrogen from gaseous mixtures also containing contaminants. The gaseous mixture is contacted with a liquid fluorocarbon in an absorption zone maintained at superatmospheric pressure to preferentially absorb the contaminants in the fluorocarbon. Unabsorbed gas enriched in hydrogen or helium is withdrawn from the absorption zone as product. Liquid flurocarbon enriched in contaminants is withdrawn separately from the absorption zone.</p>
申请公布号 JPS4846591(A) 申请公布日期 1973.07.03
申请号 JP19720102331 申请日期 1972.10.12
申请人 发明人
分类号 B01D53/14;C01B3/52;C01B23/00;(IPC1-7):C01B1/33 主分类号 B01D53/14
代理机构 代理人
主权项
地址