发明名称 SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE
摘要 There are provided a semiconductor substrate and a semiconductor laser using the semiconductor substrate which promises smooth and optically excellent cleaved surfaces and is suitable for fabricating semiconductor lasers using nitride III-V compound semiconductors. Using a semiconductor substrate, such as GaN substrate, having a major surface substantially normal to a {0001}-oriented face, e.g. {01-10}-oriented face or {11-20}-oriented face, or offset within ±5° from these faces, nitride III-V compound semiconductor layers are epitaxially grown on the substrate to form a laser structure. To make cavity edges, the GaN substrate is cleaved together with the overlying III-V compound semiconductor layers along high-cleavable {0001}-oriented faces.
申请公布号 US2001048114(A1) 申请公布日期 2001.12.06
申请号 US19980088743 申请日期 1998.06.02
申请人 MORITA ETSUO;IKEDA MASOA;KAWAI HIROJI 发明人 MORITA ETSUO;IKEDA MASOA;KAWAI HIROJI
分类号 C30B29/38;H01L33/00;H01S5/00;H01S5/02;H01S5/323;(IPC1-7):H01L33/00;H01L29/04 主分类号 C30B29/38
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