发明名称 METHOD FOR CLEANING SUBSTRATE, CLEANING DEVICE, METHOD FOR MANUFACTURING SHERBET FOR CLEANING SUBSTRATE AND DEVICE USING THIS METHOD
摘要 PROBLEM TO BE SOLVED: To enhance the efficiency of manufacturing a sherbet depending on the kind of a substrate and clean the substrate using the sherbet of a desired property. SOLUTION: The substrate cleaning device comprises a substrate gripping means, a means to supply the sherbet containing a chemical solution and snow ice, a relatively moving means for relatively moving the supplied sherbet to the surface of the substrate and a sherbet manufacturing device. The sherbet manufacturing device is equipped with a mixing container 12 for mixing the chemical solution and pure water for the snow ice at a specified mixing ratio, a supercooling means for supercooling the mixture at a specified temperature which is lower than the freezing point of the pure water and higher than the freezing point of the chemical solution and a stirring blade 16 which rotates centered around a rotary axis extending almost in the vertical direction so as to uniformly stir the mixture in the mixing container 12. The stirring blade 16 has an outer edge which constitutes a stirring radius between the inner wall of the container 12 and the rotary axis so that the inner wall is not rubbed during mixing and removes particles from the surface of the substrate with the help of the sherbet of a desired property to clean the substrate.
申请公布号 JP2001334217(A) 申请公布日期 2001.12.04
申请号 JP20000133350 申请日期 2000.05.02
申请人 SUPURAUTO:KK 发明人 HARANO RIICHIRO;FURUSAWA MASAZO;JOYA SATOSHI
分类号 B08B1/00;B08B3/08;C11D7/06;C11D7/26;H01L21/304;(IPC1-7):B08B1/00 主分类号 B08B1/00
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