Dosimetry cup charge collection in plasma immersion ion implantation,申请号EP19990307092-传众专利搜索

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发明名称	Dosimetry cup charge collection in plasma immersion ion implantation
摘要
申请公布号	EP0994203(A3)	申请公布日期	2001.11.21
申请号	EP19990307092	申请日期	1999.09.07
申请人	AXCELIS TECHNOLOGIES, INC.	发明人	CHEN, JIONG;KELLERMAN, PETER LAWRENCE;DENHOLM, ALEC STUART;SHAO, JIQUN
分类号	H01J37/317;C23C14/48;H01J37/32;H01L21/265;(IPC1-7):C23C14/48;C23C14/54;H01J37/244	主分类号	H01J37/317
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