Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same

摘要

A method is provided for evaluating a transmittance of an optical member for ultraviolet use, which is an object of measurement. The method includes the steps of cleaning the object of measurement, measuring a transmittance of the object of measurement within a predetermined time period from completion of the cleaning during which a rate of decrease in the transmittance of the object of measurement remains substantially constant, and correcting the transmittance measured in the step of measuring to a transmittance at an evaluation time arbitrarily selected within the predetermined time period in accordance with the constant rate of decrease in the transmittance and a time at which the transmittance is measured.