发明名称 Wafer notch polishing machine and method of polishing an orientation notch in a wafer
摘要 The notch polishing machine employs a plurality of polishing tapes which can be sequentially introduced into the notch of a wafer to polish both sides of the notch, i.e. the top and bottom surfaces. Each tape is pulled off a supply reel and passed into a mounting block sized to fit into the wafer notch. Each block is also mounted to be oscillated to effect a polishing action. Also, all the blocks are mounted in common to be pivoted between a position angularly disposed relative to the top of the top of the wafer and a position angularly disposed relative to the bottom of the wafer.
申请公布号 US6306016(B1) 申请公布日期 2001.10.23
申请号 US20000631656 申请日期 2000.08.03
申请人 TSK AMERICA, INC. 发明人 STEERE, JR. ROBERT E.;STEERE, III ROBERT E.
分类号 B24B9/00;B24B9/06;B24B21/00;B24B21/08;B24B21/16;B24B27/00;H01L21/304;(IPC1-7):B24B1/00 主分类号 B24B9/00
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