发明名称 COMPOSITE MATERIAL FOR DEPOSITION AND ITS PRODUCING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a composite material for deposition in which an deposited film is obtained in a single deposition operation, having the initial composition of the deposition composed of aluminum in 100% and the post composition composed of metals A and B in total 100%. SOLUTION: A composite material for deposition has a composite structure provided with aluminum as outer layer and a metal A hard to deposite compared to aluminum as inner layer. A barrier layer composed of a metal B hard to depisite compared to the metal A is formed between the aluminum and metal A layers. The metal A is composed of at least one material selected from beryllium, tin, gold, chromium, iron, cobalt, nickel, silicon, titanium, vanadium, platinum, rhodium, ruthenium, molybdenum, carbon, niobium, osmium, tantalum and rhenium and the metal B is composed of at least one material selected from gold, chromium, iron, cobalt, nickel, silicon, titanium, vanadium, platinum, rhodium, ruthenium, molybdenum, carbon, niobium, osmium, tantalum, rhenium and tungsten.
申请公布号 JP2001279427(A) 申请公布日期 2001.10.10
申请号 JP20000097181 申请日期 2000.03.31
申请人 HITACHI METALS LTD 发明人 FURUICHI SHINJI
分类号 C23C14/24;H01J9/22;(IPC1-7):C23C14/24 主分类号 C23C14/24
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