发明名称 THERMAL CONDUCTIVITY ENHANCED SEMICONDUCTOR STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor structure wherein the thermal conductivity is enhanced, and its manufacturing method. SOLUTION: During manufacturing of selected electronic components, silicon is formed at selected position on a substrate. Dielectric isolation regions are formed in an upper silicon layer and filled with a thermal conductive material. Before depositing the thermal conductive material, a liner material may be deposited at option. In a second embodiment, a horizontal layer of the thermal conductive material is deposited in an oxide layer or bulk silicon layer beneath the upper silicon layer.
申请公布号 JP2001274343(A) 申请公布日期 2001.10.05
申请号 JP20010048615 申请日期 2001.02.23
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 GAUTHIER JR ROBERT J;SCHEPIS DOMINIC J;TONTI WILLIAM R;VOLDMAN STEVEN H
分类号 H01L27/04;H01L21/762;H01L21/763;H01L21/822;H01L23/367;H01L27/00;H01L27/12;H01L29/786;(IPC1-7):H01L27/04 主分类号 H01L27/04
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