发明名称 |
THERMAL CONDUCTIVITY ENHANCED SEMICONDUCTOR STRUCTURE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor structure wherein the thermal conductivity is enhanced, and its manufacturing method. SOLUTION: During manufacturing of selected electronic components, silicon is formed at selected position on a substrate. Dielectric isolation regions are formed in an upper silicon layer and filled with a thermal conductive material. Before depositing the thermal conductive material, a liner material may be deposited at option. In a second embodiment, a horizontal layer of the thermal conductive material is deposited in an oxide layer or bulk silicon layer beneath the upper silicon layer. |
申请公布号 |
JP2001274343(A) |
申请公布日期 |
2001.10.05 |
申请号 |
JP20010048615 |
申请日期 |
2001.02.23 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
GAUTHIER JR ROBERT J;SCHEPIS DOMINIC J;TONTI WILLIAM R;VOLDMAN STEVEN H |
分类号 |
H01L27/04;H01L21/762;H01L21/763;H01L21/822;H01L23/367;H01L27/00;H01L27/12;H01L29/786;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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