发明名称 MAIN ELECTRODE SHORTED ELECTROSTATIC INDUCTION SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a high-frequency switching element having a high breakdown voltage wherein a large current is quickly cut off with a small gate current by applying a large reverse gate voltage even if the impurity concentration in a channel region is low for pinching off the channel region quickly, related to an electrostatic induction thyristor provided with a low-resistance cathode short region for directly discharging accumulated carries in a drain region and channel region into the cathode electrode when turned off. SOLUTION: Along the entire peripheral part of an island region surrounded by a recess 14 on one surface of an n-type silicon substrate 11, a p-type gate region 13, a gate electrode 21 contacting it, a p-type cathode short region 15 surrounded by the gate region, an n-type cathode region 18, and a cathode electrode 22 contacting the cathode region and the cathode short region, and formed. A depletion layer suppressing layer 16 which is of the same n-type as the silicon substrate with impurity concentration higher than it is formed between the cathode short region and the silicon substrate surrounded by the gate region.
申请公布号 JP2001274374(A) 申请公布日期 2001.10.05
申请号 JP20000082351 申请日期 2000.03.23
申请人 NGK INSULATORS LTD 发明人 SEKIYA TAKAYUKI;MIYOSHI SANETO;TERASAWA YOSHIO
分类号 H01L29/74;(IPC1-7):H01L29/74 主分类号 H01L29/74
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