| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and method for alignment and a device and method for exposure by which the positioning of a substrate and the detection of the focal position of an alignment optical system before the substrate is positioned can be performed with high accuracy. SOLUTION: The aligner detects the positions of the alignment marks AM1-AM4 of a wafer on which the marks AM1-AM4 are formed along street lines SL. The aligner projects light upon areas on the lines SL which are different from the areas where the marks AM1-AM4 are formed for detecting positional deviations. It is preferable to project rectangular illuminating light rays ILX1 and ILX2 having their lengthwise directions in the X-direction, and rectangular light rays ILY1 and ILY2 having their lengthwise directions in the Y-direction for making preparations for such a case that the street lines SL are formed to orthogonally cross each other. |
