| 摘要 |
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap. |
