发明名称 METHOD FOR PRODUCING MAGNESIUM OXIDE FILM
摘要 PROBLEM TO BE SOLVED: To uniformly deposit a MgO film on a substrate. SOLUTION: A plasma electron current from a plasma gun 20 is spread into a sheet shape by the magnetic field to make into sheet plasma 27, a target 3 made of magnesium and a substrate 4 are oppositely arranged parallel across the sheet plasma 27 held, sputtering voltage is applied to the target 3, inert gas ions in the plasma are collided against the target 3 to generate magnesium vapor, and the magnesium vapor and gaseous oxygen fed from a manifold tube 11 disposed in the vicinity of the substrate 4 are reacted to deposit a magnesium oxide film on the substrate.
申请公布号 JP2001220669(A) 申请公布日期 2001.08.14
申请号 JP20000030776 申请日期 2000.02.08
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 KAWAGUCHI NORIHITO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;KAWASAKI YOSHINORI
分类号 C23C14/34;C23C14/08;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/34;H01J11/02 主分类号 C23C14/34
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