发明名称 |
METHOD FOR PRODUCING MAGNESIUM OXIDE FILM |
摘要 |
PROBLEM TO BE SOLVED: To uniformly deposit a MgO film on a substrate. SOLUTION: A plasma electron current from a plasma gun 20 is spread into a sheet shape by the magnetic field to make into sheet plasma 27, a target 3 made of magnesium and a substrate 4 are oppositely arranged parallel across the sheet plasma 27 held, sputtering voltage is applied to the target 3, inert gas ions in the plasma are collided against the target 3 to generate magnesium vapor, and the magnesium vapor and gaseous oxygen fed from a manifold tube 11 disposed in the vicinity of the substrate 4 are reacted to deposit a magnesium oxide film on the substrate.
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申请公布号 |
JP2001220669(A) |
申请公布日期 |
2001.08.14 |
申请号 |
JP20000030776 |
申请日期 |
2000.02.08 |
申请人 |
ISHIKAWAJIMA HARIMA HEAVY IND CO LTD |
发明人 |
KAWAGUCHI NORIHITO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;KAWASAKI YOSHINORI |
分类号 |
C23C14/34;C23C14/08;H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):C23C14/34;H01J11/02 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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