MONOMER FOR RESIST AND ITS PURIFYING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for purifying a crude monomer for resist by which impurities can be easily and effectively removed from a polymerizable or decomposable monomer, having a high boiling point or a low melting point used as a stock monomer of a polymer for a resist. SOLUTION: In the purification of the crude monomer for resist obtained by esterification reaction, the crude monomer is cleaned with water and/or an organic solvent and is brought into contact with an adsorbent or the crude monomer is subjected to thin-film distillation.