| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a circuit pattern inspection apparatus suited for obtaining defective images with high resolution and high S/N with high efficiency at defective image capture time. SOLUTION: Switching between a primary electron ray fact deflection control circuit 43 for inspection and a primary electron beam deflection control circuit for obtaining a defective image 56 is done through a switch 54. By connecting the switch 54 to the primary electron beam high-speed deflection control circuit 43 for inspection allows high-speed deflection that follows stage movement, which conducts the inspection of a circuit pattern. In addition, connecting the switch 54 to the primary electron beam deflection control circuit 56 for obtaining the defective image allows low-speed deflection. This condition is maintained at automatic defect classification time, after circuit pattern inspection. Thus, it is possible to obtain a images with high resolution and high S/N with high efficiency at capture of defective images.</p> |
