| 发明名称 |
Plasma processing device for surfaces |
| 摘要 |
A mechanism for plasma surface treatment includes a rotating head having at least one eccentrically disposed plasma nozzle for generating a plasma jet directed in parallel with the axis of rotation. The nozzle includes a swirl system for swirling the plasma jet.
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| 申请公布号 |
US6265690(B1) |
申请公布日期 |
2001.07.24 |
| 申请号 |
US20000445016 |
申请日期 |
2000.04.20 |
| 申请人 |
COTTIN DEVELOPMENT LTD. |
发明人 |
FOERNSEL PETER;BUSKE CHRISTIAN |
| 分类号 |
H05H1/24;B05D3/14;B29C59/14;C08J7/00;H05H1/44;(IPC1-7):B23K9/00 |
主分类号 |
H05H1/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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