| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same. SOLUTION: The photosensitive polymer is represented by formula I (wherein R1 is an acid-decomposable tertiary alkyl ester group; R2 is hydrogen atom, methyl, ethyl, carboxyl, γ-butyrolacton-2-yl-ester, γ-butyrolacton-3-yl-ester, pantolacton-2-yl-ester, mevalonic lactone ester, 3-tetrahydrofurabyl-ester, 2,3- propylene carbonat-1-yl-ester, 3-methy-γ-butyrolacton-3-yl-ester or a 3-20C alicyclic hydrocarbon compound; a/(a+b+c)=0.1-0.7; b/(a+b+c)=0.1-0.8; c/(a+b+c)=0.0-0.8; and (n) is an integer of 0-2). |
