发明名称 Hydrogen annealing method and apparatus
摘要 A processing method includes providing a first gas including a hydrogen atom into a first chamber, igniting a plasma within the first chamber to provide a source of hydrogen atoms, passing the plasma downstream through a cavity to a second chamber disposed separately from the first chamber, and heating an object disposed within the second chamber.
申请公布号 US6255197(B1) 申请公布日期 2001.07.03
申请号 US19990328937 申请日期 1999.06.09
申请人 MITZEL JIM 发明人 FUJIMURA SHUZO;TAKAMATSU TOSHIYUKI
分类号 H01L21/28;H01L21/30;H01L21/324;(IPC1-7):H01L21/322 主分类号 H01L21/28
代理机构 代理人
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