发明名称 SEMICONDUCTOR DEVICE AND PRODUCING METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide the electric fuse of a small area composed of a thin insulating film and a producing method therefor. SOLUTION: This device is provided with an active region 5 formed on a wafer 1, an isolation region 2 formed on the wafer 1 for isolating the active region 5, and gates 6A and 6B formed in the active region 5 through gate oxide films 7A and 7B, The gate oxide films 7A and 7B are operated as electric fuse.</p>
申请公布号 JP2001176975(A) 申请公布日期 2001.06.29
申请号 JP19990358760 申请日期 1999.12.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAGAI TAKAHIRO;MAMETANI TOMOHARU;NAKADA YOJI;KIDO SHIGENORI;KISHIDA TAKESHI;KINUGASA AKINORI;NISHIMURA HIROAKI;MATSUFUSA JIRO
分类号 H01L27/04;H01L21/82;H01L21/822;H01L23/525;H01L27/02;(IPC1-7):H01L21/82 主分类号 H01L27/04
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