| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence of color non-uniformity caused by defocusing at the time of exposure and to keep throughput as high as possible. SOLUTION: While a first selection reference is set, a selector 93 selects plural detecting points for controlling pitching and rolling of a wafer W, and while a second selection reference is set, the selector selects plural detecting points for preferentially controlling rolling of the wafer W. In the case of scanning exposure, according to each of selection references, the Z position, pitching and rolling of the wafer or Z position and rolling of the wafer are controlled by a controller 20. Therefore, the occurrence of color non-uniformity caused by defocusing can be prevented by accurately controlling the Z position and rolling on the surface of the wafer, where an influence upon defocusing is considerable, and throughput can be kept as high as possible by performing so-called completely alternate scanning even in the case of the exposure of a peripheral shot.
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