发明名称 TREATING METHOD FOR TRANSPARENT ELECTRICALLY CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a technique capable of improving the transmissivity of a transparent electrically conductive film. SOLUTION: Substrates 11 to 13 deposited with transparent electrically conductive films 16 to 18 are carried into vacuum tanks 21, 31 and 41, treating gas is introduced therein, and the surfaces of the transparent electrically conductive films 16 to 18 are exposed to treating gas plasma. The surfaces of the transparent electrically conductive films 16 to 18 are reformed to improve the transmissivity thereof. Gases of O2, Ar, HCl, CF4, CHF3 and SF6 can be used for treatment. As for the desirable treating conditions, the range of pressure is 10.6 to 29.3 Pa in the case of gaseous Ar and 10.6 to 46.6 Pa in the case of gaseous O2.
申请公布号 JP2001158963(A) 申请公布日期 2001.06.12
申请号 JP19990341622 申请日期 1999.12.01
申请人 ULVAC JAPAN LTD 发明人 KAWAMURA HIROAKI;TAKEI HIDEO;OTA YOSHIFUMI
分类号 H01B13/00;C23C14/08;C23C14/58;G02F1/1343;(IPC1-7):C23C14/58;G02F1/134 主分类号 H01B13/00
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