| 摘要 |
PURPOSE:To conduct reaction processing of a minute pattern all over a substrate uniformly and at high accuracy. CONSTITUTION:A reaction chamber 1 is provided with a substrate-temperature controlling plate 3 on which a substrate 5 is mounted and which can controls the temperature of the substrate and has an inlet 7 for introducing reactive gas in the chamber 1. A plate member 8 is provided between the substrate 5 and the inlet 7. The plate member 8 has a portion guiding the reactive compound 10 to the surface of the substrate 5, and has a shielding portion which prevent direct supply of the reactive compound 10 to the substrate 5. |
