发明名称 SAMPLE POSITIONING MECHANISM
摘要 PROBLEM TO BE SOLVED: To provide a polarimetric analysis apparatus whereby a target sample and a measurement sample can be arranged to a proper position in a proper orientation. SOLUTION: The polarimetric analysis apparatus 100 is provided with the sample positioning mechanism for adjusting heights and inclinations of the target sample 114 and the measurement sample 124. The sample positioning mechanism has height and inclination-adjusting means 300 and 400 for the target sample and the measurement sample respectively. The height and inclination- adjusting means 300 and 400 have CCD units 310 and 410 for height measurement and CCD units 320 and 420 for inclination measurement respectively. The CCD units 310 and 410 include mirrors 312 and 412 for appropriately deflecting light beams and CCD cameras 316 and 416 respectively. The CCD units 320 and 420 include mirrors 322 and 422 for appropriately deflecting light beams, objective lenses 326 and 426, and CCD cameras 328 and 428 respectively.
申请公布号 JP2001153798(A) 申请公布日期 2001.06.08
申请号 JP19990336288 申请日期 1999.11.26
申请人 OLYMPUS OPTICAL CO LTD 发明人 MIZOGUCHI IWAO
分类号 G01B11/06;G01N21/01;G01N21/21;(IPC1-7):G01N21/21 主分类号 G01B11/06
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