Semiconductor optical device having a compound semiconductor layer including aluminium

摘要

A selective growth process for depositing a compound semiconductor layer (32) or a semiconductor optical device including A1 includes the step of introducing a mixture of source gas for the compound semiconductor layer (32) and halogen compound gas including carbon and halogen. The halogen compound gas suppresses deposition of polycrystalline substance and allows a higher growth rate at a lower temperature. The process is applied to burying process, selective area growth process and butt joint growth process. <IMAGE>