发明名称 |
SILICA GLASS OPTICAL MATERIAL FOR EXCIMER LASER AND EXCIMER LAMP, AND METHOD FOR PRODUCTION THEREOF |
摘要 |
PURPOSE: To provide a silica glass optical material that has high initial transmission to the excimer laser or excimer lamp of 155-195 nm wavelength and a small fluctuation range in the refractive index (Δn) and shows excellent durability under irradiation therewith for a long time. CONSTITUTION: This invention relates to a silica glass optical material for the rays or beams from an Excimer laser and Excimer lamp and characteristically has the following physical and chemical properties: the silica glass optical glass is ultra-high pure, has an OH group content of 1-100 wt.ppm, a H2 content of 5x1016-5x1019 molecules/cm3, and a F content of 10-10,000 wt.ppm, substantially no content of halogens other than F and a fluctuation range in the refractive index (Δn) of 3x10-6-3x10-7.
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申请公布号 |
KR20010039472(A) |
申请公布日期 |
2001.05.15 |
申请号 |
KR19990048058 |
申请日期 |
1999.11.01 |
申请人 |
SHIN-ETSU QUARTZ PRODUCTS CO., LTD. |
发明人 |
YAMAGATA SHIGERU |
分类号 |
C03B8/04;C03B19/14;C03B20/00;C03C3/06;G02B1/00;G03F7/20;(IPC1-7):C03C3/06 |
主分类号 |
C03B8/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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