| 发明名称 |
PRODUCTION OF HIGH PURITY HYDROCHLORIC ACID |
| 摘要 |
The invention relates to a novel method, which can be carried out according to industrial standards, for producing high-purity hydrochloric acid with a ver y low particle content, for use in the production of semiconductors.
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| 申请公布号 |
CA2387584(A1) |
申请公布日期 |
2001.04.12 |
| 申请号 |
CA20002387584 |
申请日期 |
2000.10.04 |
| 申请人 |
MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG |
发明人 |
HOSTALEK, MARTIN;BUTTNER, WERNER;LU, CHING-PENG;KAN, CHING-JUNG |
| 分类号 |
C01B7/01;C01B7/07;H01L21/00;(IPC1-7):C01B7/07 |
主分类号 |
C01B7/01 |
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