APPARATUS FOR DEVELOPING MASK

摘要

PURPOSE: An apparatus for developing a mask is provided to uniformly hold the width of mask line by compensating the temperature in the peripheral portion of a mask. CONSTITUTION: A first spray nozzle(230) is installed on the top of a mask chuck(210) at regular intervals. The first spray nozzle attached to the side wall of a mask developing apparatus sprays a developing solution toward the center portion of the mask chuck. A second spray nozzle(240) is also installed on the top of the mask chuck at regular intervals. The second spray nozzle attached to the other side wall of the mask developing apparatus sprays a developing solution toward the peripheral portion of the mask chuck. The first spray nozzle has a first thermostat(250), and the second spray nozzle has a second thermostat(260). The second thermostat controls the temperature of the developing solution sprayed from the second spray nozzle so that it is higher than the temperature of the developing solution sprayed from the first spray nozzle. Therefore, the temperatures of the peripheral portion and the center portion of the mask are uniformly hold although the temperature of the peripheral portion of the mask is rapidly dropped.