发明名称 |
PRODUCTION OF OPTICAL WAVEGUIDE ELEMENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a process for producing an optical waveguide element capable of forming an indium-containing transparent oxide electrode which comes into contact with an optical waveguide consisting of a ferroelectric thin film without impairing the electro-optic characteristics of the optical waveguide element. SOLUTION: This process for producing the optical waveguide element has an optical waveguide forming stage for forming the optical waveguide consisting of the ferroelectric thin film on a substrate, an electrode forming stage for forming the indium-containing transparent oxide electrode which comes into contact with the optical waveguide to a prescribed shape at a temperature above 0 deg.C and below 150 deg.C in an oxygen-containing atmosphere and an annealing treatment stage for subjecting the formed transparent oxide electrode to an annealing treatment.</p> |
申请公布号 |
JP2001075133(A) |
申请公布日期 |
2001.03.23 |
申请号 |
JP20000053222 |
申请日期 |
2000.02.29 |
申请人 |
FUJI XEROX CO LTD |
发明人 |
WATABE MASAO;NASHIMOTO KEIICHI |
分类号 |
G02B6/12;G02F1/31;(IPC1-7):G02F1/31 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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