发明名称 PRODUCTION OF OPTICAL WAVEGUIDE ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a process for producing an optical waveguide element capable of forming an indium-containing transparent oxide electrode which comes into contact with an optical waveguide consisting of a ferroelectric thin film without impairing the electro-optic characteristics of the optical waveguide element. SOLUTION: This process for producing the optical waveguide element has an optical waveguide forming stage for forming the optical waveguide consisting of the ferroelectric thin film on a substrate, an electrode forming stage for forming the indium-containing transparent oxide electrode which comes into contact with the optical waveguide to a prescribed shape at a temperature above 0 deg.C and below 150 deg.C in an oxygen-containing atmosphere and an annealing treatment stage for subjecting the formed transparent oxide electrode to an annealing treatment.</p>
申请公布号 JP2001075133(A) 申请公布日期 2001.03.23
申请号 JP20000053222 申请日期 2000.02.29
申请人 FUJI XEROX CO LTD 发明人 WATABE MASAO;NASHIMOTO KEIICHI
分类号 G02B6/12;G02F1/31;(IPC1-7):G02F1/31 主分类号 G02B6/12
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