| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive composition, having high resolution and high sensitivity by using a polymer containing the units of a specified acrylic ester monomer and an acid-generating agent which generates an acid, when irradiated. SOLUTION: This radiation sensitive composition contains a polymer- containing structural units of a formula and an acid generating agent which generates an acid, when it is irradiated. In the formula, X is a halogen or cyano group, Z is O atom or imino group, R1 is a single bond or a 1-10C alkylene in which C combined with Z is primary or secondary, A is a 6-18C arylene, R2 is a single bond or a 1-10C alkylene, in which C combined with A is primary or secondary and R3 is a group which is decomposed by the action of an acid, released and replaced by H. Since an acid-generating agent is added to the polymer containing the monomer units of the ester of acrylic acid, pattern formation by a chemical amplification mechanism is attained, and pattern having high sensitivity and high resolution pattern is obtained. |
