Method and apparatus for adjustably supporting a light source for use in photolithography

摘要

A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and optionally a diffuser for capturing a substantial portion of the gas so that the gas may be recycled in a closed-loop system. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like. A remotely-controlled XYZ micro-positioning stage facilitates alignment of the nozzle and the diffuser to the radiated energy beam.