| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing a deposition film capable of removing a film deposited on the inside of a treating device with high efficiency, furthermore to provide a heating element CVD device capable of in situ cleaning and to provide a cleaning method therefor. SOLUTION: The inside of a treating chamber 1 is disposed with a heating element 3 in which at least the surface is composed of platinum, the inside of the treating chamber is exhausted, thereafter, the heating element is heated and held, cleaning gas, by which active seed produced by being decomposed and/or activated by the heating element is brought into reaction with the deposition film, and the deposition film is converted into a gaseous substance, is introduced, and the produced gaseous substance is exhaused, by which the deposition film is removed.
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