发明名称 EXTENSION-TYPE SHADOW MASK FOR CATHODE RAY TUBE
摘要 PROBLEM TO BE SOLVED: To provide an extension-type shadow mask in a cathode ray tube capable of preventing lowering of resolution by shadow reflection of a tie bar and improving recognition by visual sense. SOLUTION: This shadow mask includes many strips 41 isolated one another by a prescribed interval and have slits 42 formed, tie-bars 43 linking the adjacent strips 41 and partitioning the slits 42 and auxiliary tie bars 44 which are provided among tie bars 43 and extend from at least one strip 41 of the two strips opposed each other to the other strip 41 side. The vertical widths of the auxiliary tie bars 44 in directions parallel to the strips 41 are formed to be wider than the vertical widths of the tie bars 43.
申请公布号 JP2001043808(A) 申请公布日期 2001.02.16
申请号 JP20000194719 申请日期 2000.06.28
申请人 SAMSUNG SDI CO LTD 发明人 KIN KAN;SHIN JUNCHORU;KANG GWANG-SOO
分类号 H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J29/07
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