发明名称 |
Dresser and dressing apparatus |
摘要 |
<p>A dresser (21) for dressing a polishing pad used for polishing a material to be polished is disclosed, the dresser (21) comprising: a dresser principal (22) and a dressing-working part (23) which is provided as a body other than the dresser principal (22); and a holding means for holding the dressing-working part (23) in such a manner that the dressing-working part (23) can be attached to and detached from the dresser principal (22). <IMAGE></p> |
申请公布号 |
EP1075898(A2) |
申请公布日期 |
2001.02.14 |
申请号 |
EP20000116133 |
申请日期 |
2000.07.31 |
申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
TANAKA, HIROSHI;RIKITA, NAOKI;ATAKA, YOSHITADA;OWADA, ISAO |
分类号 |
H01L21/304;B24B53/017;B24B53/12;B24D7/06;(IPC1-7):B24B37/04;B24B53/007 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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