| 摘要 |
<p>The present invention relates to a method for cleaning dentures, and more particularly to a method comprising immersing the denture in an aqueous bath comprising a surfactant or mixture of surfactants including at least 0.1 % non-ionic surfactant, the bath having a cloud point of from 45 °C to 95 °C, heating the bath to a temperature above the cloud point, for example by microwaving, and thereafter cooling the denture to a temperature below the cloud point. The method provides improved plaque removal. The invention further relates to a denture receptacle comprising from 30 to 300 mls aqueous bath comprising a surfactant or mixture of surfactants, the bath having a cloud point of from 45 °C to 95 °C and comprising at least 0.1 % non-ionic surfactant and further having a denture immersed therein. The invention yet further relates to liquid cleaning concentrates comprising hydrogen peroxide and a mixed non-ionic/anionic surfactant system for practising the methods of the invention.</p> |
