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发明名称
Charged particle beam exposure device with aberration correction
摘要
申请公布号
GB2352323(A)
申请公布日期
2001.01.24
申请号
GB20000013551
申请日期
2000.06.02
申请人
* ADVANTEST CORPORATION
发明人
KENICHI * KAWAKAMI
分类号
G03F7/20;H01J37/09;H01J37/147;H01J37/153;H01L21/027;(IPC1-7):H01J37/30
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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