| 摘要 |
<p>A sputtering target which comprises an oxide containing Zn, Al and Y, which can be used for a DC sputtering method, and with which a transparent conductive film having a resistivity of from 10<-2> to 10<10> OMEGA .cm can be produced stably, and a transparent conductive film which comprises an oxide containing Zn, Al and Y, and which has a resistivity of from 10<-2> to 10<10> OMEGA .cm and a low light absorptivity.</p> |
