MASK LAYOUT FOR MANUFACTURING BANK

摘要

PURPOSE: A mask layout for manufacturing a bank is provided to prevent a pattern defect, by moving a pattern on a mask vertically and horizontally, and by forming identical patterns along a direction of a scanner. CONSTITUTION: In a mask layout wherein patterns for a plurality of banks are formed, identical patterns are formed by transferring one of the patterns on the mask vertically and horizontally. The identical patterns can also be formed along a direction of a scanner by transferring the pattern on the mask vertically and horizontally.