| 摘要 |
PROBLEM TO BE SOLVED: To form a uniform thin film and to form an ultrafine pattern nearly independent of process conditions such as PEB temperature. SOLUTION: A surfactant 1 is mixed with apolar molecules 4 and formed into a film and a part of the film is charged up by irradiation with electron beams 5 to disturb the regular arrangement of the film. The charged-up part is made soluble in a solvent and patterning is carried out. Since a built-up film of molecules is used, a thin film free from defects due to mist and uniform in film thickness is obtained and a very fine pattern can be formed. Since electron charge-up is utilized, the pattern can be resolved even with microcolumn multi-beams from which beams at high acceleration voltage cannot be obtained or with entirely general patterning beams utilizing photoelectric effect. |
