发明名称 POLISHING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently and satisfactorily perform a flow polishing by filling a medium in a circular polishing tank, rotating a rotary disc arranged on the lower part within the polishing tank to stir and fluidize the medium, and inserting a work mounted on a spindle into this fluidized medium. SOLUTION: A circular polishing tank 2 containing a dry medium 3 is fixed onto a frame 1. A rotary disc 4 is rotatably arranged on the lower center within the polishing tank 2, and a medium fluidized bed 3a is formed on the side part within the polishing tank 2 by the rotation of the rotary disc 4 and its centrifugal force. Works W, W are attachably and detachably mounted on jigs 17, 17 mounted on spindles 15, 15 provided protrusively on the lower ends of spindle drive boxes 14, 14. According to this structure, the work W is inserted to the laminar flow part of the fluidized bed 3a, whereby a satisfactory polishing can be performed by the relative friction between the medium 3 and the work W.
申请公布号 JP2000288907(A) 申请公布日期 2000.10.17
申请号 JP19990085578 申请日期 1999.03.29
申请人 UYEMURA SOLAR CO LTD 发明人 MATSUMOTO HIROSHI;UENOYAMA MAMORU;RYO KEN
分类号 B24B31/108;B24B31/12;(IPC1-7):B24B31/108 主分类号 B24B31/108
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