SUBSTRATE FLUID PROCESSING METHOD AND EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To prevent drying marks on a substrate caused by static electricity and water droplets in a device which processes the substrate with fluid as it rotates. SOLUTION: Cleaning plates 3 and 5 sandwiching a substrate 4 between them are formed of conductive material and grounded, by which static electricity is prevented from being generated. In a state where the substrate 4 is rotated, cleaning fluid is supplied to the gaps between the cleaning plates 3 and 5 and the substrate 4 through fluid feed openings 3a and 5a each provided to the centers of the plates 3 and 5 to clean the substrate 4, and the substrate 4 is dried out. By this setup, the substrate 4 can be processed without producing drying marks on its surface.