发明名称 METHOD AND SYSTEM FOR EVALUATING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To realize nondestructive accurate measurement by detecting the oscillatory component at specified frequency of a signal having a specified wavelength from a semiconductor sample while varying the wavelength of an electromagnetic wave continuously thereby determining the distribution of defect or impurities in the semiconductor sample in the depth direction. SOLUTION: Light from a continuous light source 1 is passed through a continuous spectrometer 2 to produce monochromatic light for irradiating a sample 10 cooled in a cryostat 9. A quartz plate 5 in the continuous spectrometer 2 is oscillated at a frequencyω, the wavelength of light being passed through a PL (photoluminescence) spectrometer 12 is fixed and the intensity corresponding to the wavelength is detected, in the form of an electric signal, by a PL photodetector 13. A component oscillating at the frequencyωof the electric signal is amplified through a lock-in amplifier 14 and taken into a data processor 15 where it is divided by the intensity of incident light I0 to obtain the distribution of defect or impurities in the depth direction corresponding to an emission line.
申请公布号 JP2000252338(A) 申请公布日期 2000.09.14
申请号 JP19990057125 申请日期 1999.03.04
申请人 NEC CORP 发明人 TERAJIMA KOICHI
分类号 G01N21/00;G01N27/00;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N21/00
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