发明名称 |
Method of forming polycrystalline silicon TFTs with TiN/Cu/TiN interconnections for a liquid crystal display pixel array |
摘要 |
The invention provides a TFT LCD structure and method for using copper conductors on polycrystalline silicon TFTs. A top gate TFT architecture is employed with the copper sandwiched between layers of TiN. Conventional photolithographic and wet etch patterning is used for the copper and TiN conductors. Copper metal gates and source/drain electrodes are provided, yielding TFTs of a quality comparable to TFTs employing aluminum electrodes and conductors. A method of fabrication is also disclosed.
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申请公布号 |
US6111619(A) |
申请公布日期 |
2000.08.29 |
申请号 |
US19990321525 |
申请日期 |
1999.05.27 |
申请人 |
SHARP LABORATORIES OF AMERICA, INC. |
发明人 |
HE, SHUSHENG;NGUYEN, TUE |
分类号 |
G02F1/1343;G02F1/136;G02F1/1362;G02F1/1368;H01L21/28;H01L21/306;H01L21/3205;H01L21/336;H01L23/52;H01L29/786;(IPC1-7):G02F1/136 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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