PRODUCTION OF ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide an electro-optic device producing method by which the surface of an insulator layer on which a single crystal silicon layer is laminated can be flattened, and to provide an electro-optic device and an electronic equipment. SOLUTION: In this electro-optic device 201, recesses 203 are formed on a light-transmitting substrate 202 and a light-shielding layer 204 is formed so as to fill the recesses 203. Then an insulator layer 205 and a single crystal silicon layer 206 are successively formed on the light-transmitting substrate 202. The area of the single crystal silicon layer 206 corresponding to the light- shielding layer 204 is formed at the area of a transistor device.