首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Compilation mechanism for a simulation model
摘要
申请公布号
EP0592076(B1)
申请公布日期
2000.08.09
申请号
EP19930305709
申请日期
1993.07.20
申请人
INTERNATIONAL COMPUTERS LIMITED
发明人
HARRIS, DUNCAN JAMES ALEXANDER;SHAAR, ZAKWAN;HODGSON, STEVEN
分类号
G06F17/50;G06F19/00;(IPC1-7):G06F17/50
主分类号
G06F17/50
代理机构
代理人
主权项
地址
您可能感兴趣的专利
METHOD OF MANUFACTURING LIGHT-EMITTING APPARATUS
DISPLAY DEVICE, AND LIGHT SOURCE DEVICE
CONTROL DEVICE FOR EDDY-CURRENT BRAKE
AUTONOMOUS TYPE PARALLEL ARITHMETIC CIRCUIT
GEL ELECTROPHORETIC SYSTEM AND METHOD FOR FOCUSING BIOMOLECULE BAND
AIRTIGHTNESS INSPECTION METHOD OF GAS SENSOR
MEMS STRUCTURE AND METHOD OF MANUFACTURING THE SAME
COMPRESSOR CONTROL DEVICE
SIGNAL-PROCESSING APPARATUS FOR GAS SENSOR
CHARGE PUMP, FREQUENCY SYNTHESIZER AND CONTROL METHOD
METHOD FOR AMPLIFYING MYCOBACTERIUM GENE
BLOCK FOR GUIDING VISUALLY HANDICAPPED PERSON, AND MANUFACTURING METHOD OF THE SAME
PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND METHOD OF MANUFACTURING THE SAME
IMAGE FORMING APPARATUS
SEMICONDUCTOR CHIP
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE-RESIN TRANSFER FILM, RESIN PATTERN, METHOD FOR MANUFACTURING RESIN PATTERN, BASE BOARD FOR LIQUID CRYSTAL DISPLAY, AND LIQUID CRYSTAL DISPLAY
HIGH-PURITY SILICA-PHOTOCATALYST COMPOSITE
PHOTOMASK BLANKS AND PHOTO MASK
PHOTOMASK BLANK AND PHOTOMASK
PHOTOSENSITIVE BLACK COMPOSITION
