| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner for accurately exposing a large-area body to be exposed highly precisely by plural-times exposure using a small-area photomask, and to provide a photosensitive resist capable of allowing the aligner to use a detector having a sensitivity region in a visible light region. SOLUTION: This aligner 1 is equipped with a light source for radiating ultraviolet rays 2, a stage 3 on which the body to be exposed is placed, the photomask 4 disposed between the light source 2 and the stage 3 and having a desired aperture pattern, a hole for forming a position mark and a window for detecting the position mark 4c formed at a specified position corresponding to the hole the detector 5 having the sensitivity region at least at one part of the region from the visible light region to an infrared light region and disposed at the position where the body to be exposed can be detected through the window 4c of the photomask, and a conveying mechanism for relatively moving the stage 3 and the photomask 4. |
