| 摘要 |
PROBLEM TO BE SOLVED: To enhance throughput and cost performance by extracting feature elements, respectively, from a reference image and an image to be detected, matching both feature elements, comparing respective feature elements and specifying a defect thereby reducing the ratio of interfering defects and lowering the necessity of human intervention. SOLUTION: The data memory 225 in a system 200 has a memory capacity for storing a reference image and for multiplex synchronous image processing, and a computer subsystem 230 having a display 235 is arranged such that processes related to inspection and examination work of a wafer can be carried out and an operator can monitor and evaluate an image. A binary feature element image is created through comparison with a threshold and then features or feature elements are extracted from an image to be inspected. After the binary feature element image is aligned, corresponding feature elements are made to match one by one thus judging defect. A defect judging process can thereby be simplified and quickened. |
